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500T/Y Tungsten Hexafluoride Project (Special Gas Purity 99.999%)
年产500吨六氟化钨项目(特气行业纯度99.999%) 500T/Y Tungsten Hexafluoride Project (Special Gas Purity 99.999%) 六氟化钨在常温常压下为无色气体,溶于多数有机溶剂。 六氟化钨主要用作电子工业中金属钨化学气相沉积(CVD)技术,形成金属钨,用于大规模集成电路(LSI)中的配线材料、制造半导体电极、导电浆糊等电子元...
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280T/Y High-purity semiconductor precursors and 500T/Y MAO (Methylaluminoxane) project
年产280吨高纯半导体前驱体及年产500吨MAO(甲基铝氧烷)项目 280T/Y High-purity semiconductor precursors and 500T/Y MAO (Methylaluminoxane) project 集成电路产业是信息产业的基础与核心,薄膜材料成为半导体集成电路制造过程的关键技术之一。其核心材料前驱体是半导体薄膜沉积工艺的主要原材料,通过化学气相...
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1000T/Y Nitrogen Trifluoride Project (Special Gas Purity 99.996%)
年产1000吨三氟化氮项⽬(特⽓⾏业纯度99.996%) 三氟化氮(Nitrogen Trifluoride),化学式NF3,是⼀种强氧化剂。作为⼀种重要的⼯业特种⽓体,具有⼴泛的应⽤领域。 在微电⼦⼯业中,三氟化氮是⼀种优良的等离⼦蚀刻⽓体,在半导体芯⽚、平板显⽰器、光纤、光伏电池等制造领域,三氟化氮主要⽤作等离⼦蚀刻⽓体...
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